product
 

 

E-Beam Defect Inspection tool
eScan 300



 200mm/300mm

Introducing to HMI eScan:
The most advanced e-beam inspection tool

eScan  is a state-of-the-art electron-beam wafer inspection system for advanced wafer manufacturers.  eScan distinguishes itself from competitors with the market leading sensitivity to electrical and physical defects in advanced devices. With the advent of eScan, defectivity baseline in advanced fabs is being recalibrated. eScan offers the shortcut to the faster yield enhancement with the smallest e-beam inspection pixel size, high resolution imaging for both inspection and review, crystal clear image quality for R&D devices, and the HMI unique self-adjusting charge control capability.

Applications:

Unlike other EBI systems, eScan is capable of reference data generation for physical as well as electrical defectivity. eScan's main application includes: Contact Etch Layer, Metal CMP Layers, L/S physical defect detection, SOI, Low K, and Cu applications.

 

Value Proposition:

  • An EBI system with a longest life time for advanced fabs.
  • An EBI system with the highest sensitivity to DOI (defect of interest) signature detection.
  • An EBI system with a lowest CoO.
  • An EBI system with the most reliable data with highest defect location matching percentage.
  • An EBI system offering the highest confidence level on advanced device analysis.

 

 

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